We are using cookies to implement functions like login, shopping cart or language selection for this website. Furthermore we use Google Analytics to create anonymized statistical reports of the usage which creates Cookies too. You will find more information in our privacy policy.
OK, I agree I do not want Google Analytics-Cookies
The Journal of Adhesive Dentistry
Login:
username:

password:

Plattform:

Forgotten password?

Registration

J Adhes Dent 20 (2018), No. 5     16. Nov. 2018
J Adhes Dent 20 (2018), No. 5  (16.11.2018)

Page 407-415, doi:10.3290/j.jad.a41359, PubMed:30417896


Effects of Selective Phosphoric Acid Etching on Enamel Using "No-wait" Self-etching Adhesives
Sato, Takaaki / Takagaki, Tomohiro / Ikeda, Masaomi / Nikaido, Toru / Burrow, Michael F. / Tagami, Junji
Purpose: To evaluate the effect of selective phosphoric acid etching on enamel using "no-wait" self-etching adhesives.
Materials and Methods: Clearfil Universal Bond Quick (UBQ, Kuraray Noritake) or G-Premio BOND (GPB, GC) was applied to ground human enamel surfaces. The adhesives were used in 3 modes: no-waiting self-etching mode (UBQ-0 or GPB-0), 10-s self-etching mode (UBQ-10 or GPB-10), and the selective-etch mode with phosphoric acid etching (UBQ-PA or GPB-PA). After an acid-base challenge, the morphological attributes of the interface were examined using scanning electron microscopy (SEM) to characterize the acid-base resistant zone (ABRZ). Microshear bond strength (µSBS) testing to enamel and ultimate tensile strength (UTS) of the adhesive resin were carried out.
Results: ABRZ formation was confirmed in all groups. UBQ-PA and GPB-PA created thicker ABRZ with no funnel-shaped erosion beneath the adhesive-enamel interface. µSBS of UBQ-PA was significantly higher than UBQ-0 and UBQ-10 (p < 0.05). However, there were no statistically signficant differences in µSBS among GPB-0, GPB-10, and GPB-PA. For the UTS, UBQ was significantly higher than GPB.
Conclusion: Selective phosphoric acid etching created a stable adhesive-enamel interface. The no-waiting self-etching concept adhesive led to a thinner ABRZ. The results of µSBS suggest that phosphoric acid etching effects on enamel are material dependent.

Keywords: enamel, multimode, no-waiting self-etching concept, phosphoric acid, acid-base resistant zone, microshear bond strength test